Effect of direct current sputtering power on the behavior of amorphous indium-gallium- zinc-oxide thin-film transistors under negative bias illumination stress: A combination of experimental analyses and device simulation

نویسندگان

  • Jun Tae Jang
  • Jozeph Park
  • Byung Du Ahn
  • Dong Myong Kim
  • Sung-Jin Choi
  • Hyun-Suk Kim
  • Dae Hwan Kim
چکیده

Articles you may be interested in Asymmetrical degradation behaviors in amorphous InGaZnO thin-film transistors under various gate and drain bias stresses Investigation on the negative bias illumination stress-induced instability of amorphous indium-tin-zinc-oxide thin film transistors Appl. Temperature dependence of negative bias under illumination stress and recovery in amorphous indium gallium zinc oxide thin film transistors Appl. Increase of interface and bulk density of states in amorphous-indium-gallium-zinc-oxide thin-film transistors with negative-bias-under-illumination-stress time Appl. The impact of SiN x gate insulators on amorphous indium-gallium-zinc oxide thin film transistors under bias-temperature-illumination stress Appl.

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تاریخ انتشار 2015